Trion ICP / RIE Dry Etch - Standard Operating Procedures

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View the SOP documentation http://www.inrf.uci.edu/sop-trion/ The Trion etcher is load lock equipped and operated via a touch screen interface. The user may employ either RIE (Reactive Ion Etching) RF power applied at the sample stage or ICP (Inductively Coupled Plasma) RF power applied at the shower head above the sample stage. The system is configured to use both chlorinated and fluorinated gases to perform a wide variety of etch recipes.

Published by: Inrfucirvine Published at: 8 years ago Category: علمی و تکنولوژی
Standard Operating Procedure rie icp Engineering (Industry) Engineer (Profession) Nanotechnology (Field Of Study) trion Irvine (City/Town/Village) Campus Of The University Of California Irvine (College/University) inrf integrated nanosystems research facility Research (Industry) Research And Development (Industry) Researcher (Profession) Dry Etch Etching Dry Etching Reactive-ion Etching dideo دیدئو trion icp rie etch دیدئو dideo power applied sample stage dry standard