Atomic Layer Deposition (ALD) - Standard Operating Procedures

۱۳.۶ K


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View the SOP documentation http://www.inrf.uci.edu/sop-ald/ This tool is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than 2000:1. This system is equipped with heated precursors lines and the option to add up to six precursor lines.

Published by: Inrfucirvine
Published at: ۶ years ago
Category: علمی و تکنولوژی